Murakami exhibited at China CSGIA 2015 held for 3 consecutive days from 21st through 23rd of October, 2015 at SNIEC (Shanghai New International Expo Centre) in Shangai, Mainland-China.

We had given a substantial space and time for the exhibition of Murakami’s own photopolymer products designed for DLE（Digital Light Engraver） units and diazo-based/non-bichromate emulsion for rotary screen appliction.

Meanwhile, the latest air-cylinder activated stretching machine AR-500F was exhibited in the stand for demonstration and it impressed visitors by high quality screen stretching process.

The show was successfully busy with the kind attention from many visitors arnound the show. We highly appreciate the visitors who stopped by our stand taking some time out of your busy schedule. Thank you very much!

Murakami Co., Ltd.
PR Officer, General Affairs Dept.
Phone: +81-3-3625-8201